Penumbuhan Film SnO2 Dengan Doping Al-Zn Menggunakan Teknik Sol-Gel Dip Coating

Authors

Norma Ikraman , Aris Doyan , Susilawati Susilawati

DOI:

10.29303/jpft.v3i2.415

Published:

2017-12-21

Issue:

Vol. 3 No. 2 (2017): Juli - Desember

Keywords:

Doping Al-Zn, film, SnO2, Sol Gel, dip Coating

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Ikraman, N., Doyan, A., & Susilawati, S. (2017). Penumbuhan Film SnO2 Dengan Doping Al-Zn Menggunakan Teknik Sol-Gel Dip Coating. Jurnal Pendidikan Fisika Dan Teknologi, 3(2), 228–231. https://doi.org/10.29303/jpft.v3i2.415

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Abstract

Al-Zn doped SnO2 (Sn1-2xAlxZnxO2) film has been growth using the sol-gel dip coating technique. The basic materials used in this study were water, C2H5OH, SnCl2.2H2O, AlCl3 and ZnCl2 with 99% purity (merck) with doping concentration variation x = 0.000, 0.005, 0.025, and 0.050. Glass substrate with size 2.54 mm x 76.2 mm x 1 mm cleaned with detergent, soaked in 30% HCl solution For 1 day and dried at 100ðC. The process of making a SnO2 sol is done by mixing the precursor with various concentrations with water and stirring using a magnetic stirrer for 30 minutes at a temperature of 80 ð C. The next step by adding ethanol, stirring at 80 ð C. for 2 hours to obtain 0.4 M sol solution The deposition of SnO2 film was carried out using a dip coater with a whitdrawl speed 12 cm/min and then heated for nucleation and grown using an electric furnace at 600 ð C for 30 minutes. This step is repeated as much as 5 repetitions to get the SnO2 film by doing Al-Zn.

References

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